84198970
Apparatus For Rapid Heating Of Semi-conductor Devices, Apparatus For Chemical Or Physical Vapour Deposition On Semi-conductor Wafers, Apparatus For Chemical Vapour Deposition On LCD Substratus
As the tariff writes it
APPARATUS FOR RAPID HEATING OF SEMI-CONDUCTOR DEVICES, APPARATUS FOR CHEMICAL OR PHYSICAL VAPOUR DEPOSITION ON SEMI-CONDUCTOR WAFERS, APPARATUS FOR CHEMICAL VAPOUR DEPOSITION ON LCD SUBSTRATUS
Where it sits
- 84Nuclear reactors, boilers, machinery and mechanical appliances; parts thereof
- 8419Machinery, Plant Or Laboratory Equipment, Whether Or Not Electrically Heated ( Excluding Furnaces , Ovens And Other Equipment Of Heading 8514 ), For The Treatment Of Materials By A Process Involving A Change Of Temperature Such As Heating, Cooking, Roasting, Distilling, Rectifying, Sterilising, Pasteurising, Steaming, Drying, Evaporating, Vaporising, Condensing Or Cooling, Other Than Machinery Or Plant Of A Kind Used For Domestic Purposes, Instantaneous Or Storage Water Heaters, Non-electric
- 841989Other :
- 84198970Apparatus For Rapid Heating Of Semi-conductor Devices, Apparatus For Chemical Or Physical Vapour Deposition On Semi-conductor Wafers, Apparatus For Chemical Vapour Deposition On LCD Substratus
GST rate
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